In order to check the mounting of sensors on the wafer stage in lithography systems a measurement system has been designed and realized. This system is able to quickly measure marker positions with accuracies better than 100 nm. This enables short testing times for measurement of the mounting reproducibility. In this presentation the design of this test bench will be presented in which the optical design, the opto-mechanical interactions and calibrations and thermal behaviour will be considered.
Harm Wichers studied applied physics at the University of Twente and did the post-MSC program mechatronics at the Eindhoven University of Technology. Since 1998 he is an optical engineer and system architect at NTS Optel and has a broad experience in designing optical systems, integrating optics with mechanics, electronics and software.