A change in view on thermal design to meet future system’s requirements
11:30 – 12:00
In the systems that are developed at ASML, precision is very important. While allowable errors on projection and positioning get more and more challenging, there is an increasing drive for throughput and yield. Thermal effects play an important role in these errors, and the difficulty to reduce these effects is increasing. To have small errors, in the picometer range, thermal drifts have to be kept in the order of micro Kelvins.
Design guidelines are used to set up a concept, and more extensive modelling and testing are used for verification. There is a trend towards using active thermal control to improve performance, and this requires a change in view on thermal design: design for control instead of control after design. Several examples are presented that demonstrate this.
Evert Westerhuis was born and raised in Groningen, The Netherlands, where he also took his studies at the University of Groningen. He graduated there as MSc Industrial Engineering and Management. He worked for Royal Dutch Shell and Liander. Currently he is group leader thermal architecture EUV scanner at ASML in Veldhoven, The Netherlands, where he is also competence owner for thermal engineering and control.