Extending DUV productivity and overlay for the 3 nm node
In his keynote, Bart Paarhuis will present the key enhancements incorporated in ASMLs new NXT platform and share future development steps enabled by the platform. These innovations build on driving the system productivity while in parallel improving the overlay performance and minimizing the scanner grid differences between NXT-based ArF/ArFi/KrF and NXE-based EUV scanners.
Both hardware as well as software improvements play an important role in improving (cross-matching) overlay performance. On the hardware side, changes have been introduced to key modules such as the projection lens and the reticle stage to better match to EUV layers. Furthermore, the new NXT platform introduces a more powerful wafer stage to support better overlay accuracy as well as improved productivity. Complementary software-based corrections are developed to further correct for grid imperfections. For instance to reduce the impact of DUV pellicle distortions, on-scanner real-time corrections have been added to the scanner metrology control architecture
The new NXT platform is currently being rolled out for the most advanced immersion and ArF scanners – the NXT:2050i. Going forward, it will support further productivity steps and improved overlay accuracy & EUV matching developments.
Bart Paarhuis is system engineer at ASML. He graduated in 1996 on Applied Physics, University of Twente on the field of fluid dynamics. Paarhuis joined ASML in 2006 and is actively involved in improving the overlay of DUV scanners. He has special interest in the impact of the various physical phenomena on the scanner overlay and focus performance. Since 2018 he is acting as a product system engineer of the NXT:2050, leading a multi-disciplinary team of system engineers and module architects who are in charge of the development of ASML’s most recent immersion scanner.